Abstract: In this paper,the TiN film and Al₂0₃ film were prepared on austenitic stainless steel by magnetron sputtering method.These films were analyzed by XRD,SEM and Microhardness test.Through the analysis,the effects of different processes on the film deposition rate,structure and properties are obtained,and the ideal parameters are given.The hardness of TiN thin film is 16.0 GPa when the deposition pressure is 1.5 Pa,and the ratio of argon to nitrogen is 16:16. The hardness of Al₂O₃ thin film reaches 25.2 GPa when the deposition pressure is 0.5 Pa,and the ratio of argon to oxygen is 10:1.