WC-Co硬质合金基体上金刚石薄膜的附着机理研究

ADHESION MECHANISMS OF DIAMOND FILM ON WC-Co CEMENTED CARBIDE SUBSTRATE

  • 摘要: 金刚石涂层在硬质合金(WC Co)基体上的附着力,是影响金刚石涂层刀具切削性能和使用寿命的关键因素。采用微波等离子体化学气相沉积(CVD)法在经酸浸蚀脱Co的硬质合金基体上生长金刚石薄膜。通过对金刚石膜/基界面的微观形貌和成分分析,初步认识了金刚石薄膜的附着机理:机械锁合作用对金刚石膜/基附着力有较大贡献;界面热应力和弱中间相的存在是导致金刚石膜自发剥离的主要原因。

     

    Abstract: Adhesion strength of diamond coating on WC-Co cemented carbide substrate is an important factor which effects diamond coated tools performance and life. Diamond films were deposited by microwave plasma chemical vapor deposition method on cemented carbide substrates etched by HNO3 solution. By analyzing the morphology and composition at the interface between diamond film and the substrate, the adhesion mechanisms were understood as follows: the mechanical interlocking has important contribution to the adhesion strength; the thermal stress and the weak interphases at the interface are the major factors which resulting in diamond film peeling off spontaneously.

     

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