薄膜应力的研究进展
THE RESEARCH PROGRESS OF THIN FILM STRESS
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摘要: 薄膜应力对薄膜性能具有重要的影响。主要介绍了薄膜应力形成机理和应力实验的研究进展,并探讨了薄膜应力研究的发展趋势。通过选择适当的工艺条件以及表面处理可以改变薄膜的应力分布,提高薄膜的性能。Abstract: Influence of thin film stress is very significant on thin film properties.The progress of thin film stress development mechanisms and stress experimental study is introduced.The dominant direction of the study of thin film stress is discussed.Through the selection of processing parameters and surface modification.The distribution of thin film stress is possible changed and thin film property is improved.