Abstract: Ni catalyst was prepared by electrodepositing method on the glass substrate which was sputtered with Ti films,and synthesized CNTs films by microwave plasma chemical vapor deposition（MPCVD） technology at low temperature（450 ℃）,using CH₄ and H₂ as gas sources.CNTs’ films morphology and structure were examined by scanning electron microscopy（SEM） and Raman spectrum.The field emission properties of CNTs films were measured with a parallel diode-type configuration in a vacuum chamber with the pressure below 2×10^-4 Pa,the turn on field was about 2.7 V/μm.It proved that: It was possible to synthesize CNTs films by MPCVD technology at low temperature,the films which were synthesized under conditions have fine field emission properties.