微波等离子体化学气相沉积装置的工作原理

WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP

摘要: 微波等离子体化学气相沉积(MPCVD)是制备金刚石膜的一种重要方法。用简单实验方法给出了MPCVD装置中微波模式转换、微波与等离子体耦合等工作原理。矩形波导中的TE₁₀模式经微波模式转换器转变为同轴线中的TEM模式,再由TEM模式转变为圆波导的TM₀₁模式。TM₀₁模式激发低压气体形成等离子体,等离子体严重影响微波模式分布。在国内首次成功运行了5kW天线耦合石英窗式MPCVD装置。

Abstract: Microwave Plasma Chemical Vapor Deposition （MPCVD） is an important method for diamond film preparation.The microwave modes such as TE 10,TEM and TM ₀₁ in the microwave mode converter of the MPCVD set ups were measured in experiments.The initial phases of TEM and TM ₀₁ modes were given respectively.The coupling between microwave and plasma was described.5 kW antenna coupled MPCVD set up was developed in China for the first time.