磁控溅射镀膜用灭弧电路

THE ELECTRIC CIRCUIT OF ARC AVOIDANCE MAGNETRON SPUTTERING COATING

  • 摘要: 为了解决无防弧功能的磁控靶三相整流直流电源在放电过程中电弧对磁控溅射镀膜工业化生产的影响,根据灭弧电路功能和电弧判别方法设计了三种类型的三相可控硅整流电弧电路,有效地抑制了该整流电源电弧造成的危害,大幅度提高了磁控溅射功能,改善了膜层的均匀性和一致性,提高了产品的成品率。

     

    Abstract: In order to avoid the effects of the arc on the magnetron sputtering coating industrized production during discharge of the triphase rectified dc power, three kinds of the triphase controlable silicon rectified arc circuit have been designed by the function of the electric circuit of arc avoidance and the methods of quickly judging arc, the damage caused by the recified arc has been efficiently inhibitted, the power of the megnetron sputtering increased, the uniformity of the coating layers improved and the finished products have become more.

     

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