微波等离子体化学气相沉积——一种制备金刚石膜的理想方法

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION --A PROMISING TECHNIQUE FOR DIAMOND FILMS GROWTH

摘要: 综述了微波等离子体化学气相沉积(MPCVD)法制备金刚石膜技术,表明MPCVD是高速、大面积、高质量制备金刚石膜的首选方法。介绍了几种常用的MPCVD装置类型,从MPCVD装置的结构特点可以看到,用该类型装置在生长CVD金刚石膜时显示出独特的优越性和灵活性。用MPCVD法制备出的金刚石膜其性能接近甚至超过天然金刚石,并在多个领域得到广泛应用。

Abstract: An overview on using microwave plasma chemical vapor deposition （MPCVD） for the growth of high quality diamond films was given. It shows that MPCVD is the first choice for high growth rate, high quality, and large area diamond films deposition. Main kinds of apparatus used in MPCVD for diamond films deposition are also concerned. The application prospects of diamond thin films were also summarized.