二氧化硅薄膜的制备及应用

PREPARATION AND APPLICATION OF SiO2 THIN FILMS

  • 摘要: 二氧化硅薄膜具有良好的硬度、光学、介电性质及耐磨、抗蚀等特性,在光学、微电子等领域有着广泛的应用前景,是目前国际上广泛关注的功能材料。论述了有关二氧化硅薄膜的制备方法,相应性质及其应用前景。

     

    Abstract: SiO2 thin films have the many excellent properties such as hardness, optical,dielectric properties, wear-resistance and corrosion-resistance. It has been widely used in optical and microelectronic applications. The preparation methods, properties and applications of SiO2 thin films are discussed.

     

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