器件表面钝化层对脉冲激光等效重离子LET值的影响

IMPACT OF DEVICE SURFACE COVERD BY A PASSIVATION LAYER ON PULSED LASER-EQUIVALENT HEAVY ION LET VALUE

  • 摘要: 介绍了激光模拟单粒子效应实验中,脉冲激光能量等效重离子线性能量传输(LET)值的理论计算方法,分析了器件表面钝化层对脉冲激光能量和重离子LET等效性计算的影响。受SiO2钝化层的调制,进入Si衬底的脉冲激光能量只占入射到器件表面激光能量的21.6%~16.1%。如果器件表面的钝化层厚度已知,且不考虑非线性效应,就可以利用激光强度透射率函数,算出更精确的脉冲激光能量等效重离子LET值。理论计算结果与相关文献报道的重离子LET值非常接近。

     

    Abstract: The value of pulsed laser energy-equivalent heavy-ion LET has been theoretically analyzed with respect to the impact of a passivation layer on device surface on the equivalent calculation between pulsed laser energy and heavy ion in laser simulation of Single-Event Effects.Modulated by passivation layer of SiO2 on device surface,laser light intensity transmitted into the silicon substrate is only 21.6%~16.1% that incident on device surface.More accurate value of the pulsed laser energy-equivalent heavy ion LET can be acquired by the pulsed laser intensity transmissivity function if passivation layer thickness is foregone and non-linear effects is neglected.The result calculated in theory accords well with heavy ion LET value reported in some correlative references.

     

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