直流磁控溅射沉积WO3薄膜电致变色性能研究

THE ELECTROCHROMIC PROPERTIES OF WO3 THIN FILMS BY DC MAGNETRON SPUTTERING

  • 摘要: 以金属钨为靶材,采用直流反应磁控溅射方法,在玻璃上制备电致变色WO3薄膜。利用X射线衍射(XRD)方法对薄膜的结构进行了分析,得出了WO3薄膜的沉积工艺。制备了WO3/ITO/Glass电致变色器件,并对其性能进行了研究。结果表明:在Li+注入前后,薄膜的透射率平均变化约50%,具有较好的可逆变色特性;Li+注入后,WO3薄膜中的一部分W6+转变为W5+,转化比例约为25%。

     

    Abstract: Using pure tungsten as target,WO3 thin films were prepared on glass substrate by DC reactive magnetron sputtering.Its crystal structures were analyzed by X-ray diffraction(XRD) method.The deposition technology of the WO3 thin film was obtained.Electrochromism device of WO3/ITO/Glass was prepared and its properties were studied.The experimental results showed that the transmissivity of the WO3 thin film changed about 50% after the Li ions in jection.The device has a preferably reversible electrochromism performance,about 25% of W6+ in the WO3 thin film change to W5+.

     

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