磁控溅射防锈MoS2薄膜沉积工艺研究

STUDY OF MAGNETRON SPUTTERING ANTI RUST MoS2 THIN FILMS DEPOSITION TECHNOLOGY

  • 摘要: 介绍了磁控溅射制备防锈MoS2薄膜的沉积工艺,同时对影响膜层性能的几个因素进行了初步的探讨,并且制备了防锈性能优良的MoS2薄膜样品。

     

    Abstract: The depositon technology of magnetron sputtering anti rust MoS2 thin films is introduced. The several factors that affected the properties of films are studied initially. The excellent anti rust MoS2 thin film samples are prepared.

     

/

返回文章
返回