磁控溅射法制备高反射铝膜

PREPARATION OF ALUMINUM THIN FILM BY MAGNETRON SPUTTERING

  • 摘要: 通过先后调整溅射沉积时间、溅射功率以及溅射气压等镀膜参数,然后结合所镀样品的反射率测量,分析了镀膜参数对铝膜反射率的影响;通过调整不同的离子束清洗时间,结合所镀样品的太阳光谱反射率测量以及附着力测试,研究了离子束清洗对铝膜性能的影响。结果表明,在这些影响因素中离子束清洗对铝膜性能的影响很大。

     

    Abstract: In this paper, Influence of sputtering parameters on properties of aluminum thin films was studied by adjusting sputtering parameters and testing optical properties of aluminum thin films. In addition, Influence of ion beam cleaning on properties of aluminum thin films was studied by adjusting ion beam cleaning times and testing adhesion and optical properties of aluminum thin films. The result revealed that ion beam cleaning has effect on aluminum thin films’ optical properties.

     

/

返回文章
返回