Abstract: The Titanium Dioxide thin Films with good quality and the definite thickness at the conditions of different oxygen flux is prepared by Mid-Frequency Reactive Magnetron Sputtering.The thin films were prepare on glass substrate.Some testing method to test its performance and the different factors effect on Titanium Dioxide thin Film effect preliminarily at the conditions of different oxygen flux are discussed.The experiment show that the performance of effect of doping Titanium Dioxide thin Film would have been changed a lot at the conditions of different oxygen flux.