Abstract: The importance of optimizing technics parameters has been studied when indium tin oxide film prepared by magnetron sputtering ceramic target. The influences of several primary technics parameters on the optical and electric performance of indium tin oxide film have been analyzed by experiments and theories. The test ranges of substrate temperature, sputtering voltage and oxygen content have been given. These results showed that indium tin oxide film with the best optical and electric performance could be prepared only when technics parameters in best ranges.