二氧化钒薄膜退火特性研究

CHARACTERIZATION OF VANADIUM DIOXIDE THIN FILMS BY ANNEALING

  • 摘要: 用磁控反应溅射法加退火工艺在石英玻璃上制备出具有相变特性的二氧化钒薄膜,通过XRD、SEM和波长200~2500nm的光学透过率的测试对薄膜的结构和特性进行分析,研究退火对薄膜的结构和光电特性的影响。

     

    Abstract: Vanadium dioxide thin films on quartz glass have been prepared by reactive magnetron sputtering methods and annealingprocess.Structural and electrical-optical properties have been characterized by XRD,SEM,resistance measurements and optics transmittance measurements in wavelength between 200~2 500 nm.Influence of annealing on thin film properties was given.

     

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