渐进因子分析法在Ta2O5/Ta样品俄歇深度剖析研究中的应用

APPLICATION OF EVOLVING FACTOR ANALYSIS IN AES DEPTH PROFILES OF Ta2O5/Ta SAMPLE

  • 摘要: 首次利用渐进因子分析法研究了Ta2O5/Ta样品的俄歇深度剖析过程,获得了样品中Ta的三种不同化学态Ta、Ta2O5和TaOx,并发现Ta2O5薄膜中经Ar+离子束轰击后产生的亚稳态产物TaOx的x值为1.6,含量接近40%。Ta2O5薄膜在深度剖析中未分解出游离态的Ta成分。

     

    Abstract: In this paper,It is firstly used of evolving factor analysis(EFA) into analyzing AES depth profiles of Ta2O5/Ta sample.It found three different chemical states of tantalum which were Ta,Ta2O5and TaO x, and discovered that,the film would decompose and produce unstable TaOx component when Ta2O5 film was being sputtered by Ar + ion. x value was 1.6 and atomic concentration was about to 40%,but no tantalum emerged in Ta2O5 during profiling.

     

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