脉冲激光薄膜制备技术

PULSED LASER DEPOSITION OF THIN FILMS

摘要: 脉冲激光薄膜沉积是近年来受到普遍关注的制膜新技术。简要介绍了脉冲激光薄膜沉积技术的物理原理、独具的特点和研究发展动态,并介绍了采用脉冲激光薄膜沉积技术制备硅基纳米PtSi薄膜的结果

Abstract: The pulsed laser deposition is a new technique for the growth of thin films,which has been attended generally by people recently. The physical principle, unique characteristics and the proceeding of the study were introduced briefly. In addation, the result of the PtSi nanometer thin film based on silicon prepared by the pulsed laser deposition was described.PULS