VACUUM AND CRYOGENICS 1998 Vol. 4 No. 1

THE EFFECT OF CONTACT INTERFACES ON THERMAL CONTACT RESISTANCE AT LOW TEMPERATURE AND VACUUM

XU Lie, ZHANG Tao, XIONG Wei, YANG Jun, XU Jiamei

1998, 4(1): 1-4.

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THE MAIN INFLUENCING FACTORS OF HIGH VACUUM MULTILAYER INSULATION

ZHOU Chong, WANG Rongshun, LU Xuesheng, GU Anzhong

1998, 4(1): 5-8.

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DEVELOPMENT OF 70 MW CLASS SUPERCONDUCTING GENERATORS IN JAPAN

GUAN Qiamin, FU Qilun

1998, 4(1): 9-12.

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PROGRESS ON THE APPLICATIONS OF SUPERCONDUCTIVITY IN PWOER SYSTEMS

GUAN Qiamin, FU Qilun

1998, 4(1): 13-16.

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SUPERFLUID HELIUM DEWARS REFRIGERATORS

XU Lie, XU Jiamei, ZHAO Lanping

1998, 4(1): 17-19.

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VACUUM COMPARISON FOR RECIPROCATING VACUUM PUMP OF SINGLE CYLINDER DOUBLE ACTING WITH SIGLE SUCTION AND DOUBLE SUCTION

JIN Yongxi, GU Haiming

1998, 4(1): 20-25.

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INFLUENCES OF DEPOSITION PRESSURE ON MW—PCVD DIAMOND FILM

YU Shiji, WU Qinchong

1998, 4(1): 26-29.

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A RFDIRECT CURRENT PLASMAENHANCED CVD INSTRUMENT

CHEN Jianguo, CHENG Yuhang, WU Yiping, QIAO Xueliang

1998, 4(1): 30-34.

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NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH

LU Qingao, WU Qinchong, SUI Yifeng, KUANG Jingan, ZHOU Yongcheng, YU Shiji, WANG Shouguo

1998, 4(1): 35-37.

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DEVELOPMENT SITUATION AND TECHNICAL ANALYSIS OF ITO FILM

ZHENG Guangwen

1998, 4(1): 38-40.

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THE PRINCIPLES, METHODS AND TECHNIQUES FOR LIQUID CONTENT MEASUREMENT IN SPACE（2）

DA Daoan, ZHANG Tianping

1998, 4(1): 41-51.

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THE RECENT DEVELOPMENT OF HIGH DENSITY PLASMA SOURCES

HUANG Guangzhou, ZHANG Shusheng, YU Jirong, LIANG Dizhong, YANG Yingjie

1998, 4(1): 52-56.

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APPLICATIONS OF SINGLE CHIP MICRO COMPUTERS FOR NONDESTRUCTIVE TEST OF VACUUM IN THE CANS

ZHOU Zhonghao, HUANG Guangzhou, WEI Kesheng

1998, 4(1): 57-60.

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